
TSMC is still evaluating the adoption of ASML's ~$400 million High-NA EUV lithography machines for future process nodes, citing ongoing success in extending the lifespan of current Low-NA EUV technology, while competitor Intel plans to use High-NA for its 14A process. TSMC's reluctance stems from the high cost and its ability to achieve substantial enhancements without the new technology, while ASML anticipates customer testing for high-volume manufacturing readiness through 2026-2027.
Taiwan Semiconductor Manufacturing Co. (TSMC) is maintaining a cautious approach towards adopting ASML's next-generation High-NA EUV lithography machines, priced at nearly $400 million each, for its upcoming A14 process node and its enhancements. TSMC executive Kevin Zhang indicated the company has yet to identify a compelling financial or technological case for immediate adoption, citing "very substantial" advancements achievable by extending the lifespan of current Low-NA EUV systems and harvesting scaling benefits. This stance, underscored by previous comments from Zhang expressing concern over the "sticker price" for the A16 node, contrasts with competitor Intel, which plans to integrate High-NA EUV into its 14A process as part of its strategy to revive its contract chip business and challenge TSMC's market leadership, though Intel will also offer customers older technologies. ASML, the sole supplier of these advanced lithography systems, anticipates customers will conduct high-volume manufacturing readiness tests with High-NA technology through 2026-2027 before evaluating the tool for their most advanced nodes. Despite TSMC's current reservations, ASML has shipped five High-NA units to three key clients: Intel, TSMC itself (presumably for evaluation), and Samsung, signaling the initial stages of industry engagement with this cutting-edge, albeit costly, technology. The divergent strategies highlight a critical juncture in semiconductor manufacturing, balancing the pursuit of technological leadership against significant capital expenditure and return on investment considerations.
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